Microstructure and thermal stability of Ti1-xAlxN coatings deposited by reactive magnetron co-sputtering
Author:
Publisher
Elsevier BV
Subject
General Engineering
Reference15 articles.
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3. Hard amorrphous Ti-Al-N coatings deposited by sputtering;Oliveira;Thin Solid Films,2008
4. Characteristics of sputtered Ti1-xAlxN films for storage node electrode barriers;Park;J. Vac. Sci. Technol.,2001
5. Characterization and temperature controlling property of TiAlN coatings deposited by reactive magnetron co-sputtering;Chen;J. Alloys compd.,2009
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