1. Behrisch, R., Eckstein, W., 2007. “Sputtering by Particle Bombardment Experiments and Computer Calculations from Threshold to MeV Energies”. LE-TEX Jelonek, Schmidt & Vöckler GbR, Leipzig.
2. Gabovich, M.D., 1972. “Physics and technology of plasma ion sources”. Atomizdat, Moscow, pp. 110-115.
3. Tumarkin, A.V., Khodachenko, G.V., Zibrov, M.S., Kaziev, A.V., 2014. Magnetron discharge with liquid metal cathode for high rate film deposition, Proceedings of the 14th International Conference on Plasma Surface Engineering, Garmisch-Partenkirchen, Germany, p. 349.
4. Handbook of Ion Sources;Wolf,1995
5. Zhukov, V.V., Kosmin, D.M., Krivobokov, V.P., Yanin, S.N., 2004. Magnetron discharge in the diode with a liquid-metal target, Proceedings of the 13th International Symposium on High Current Electronics, Tomsk, Russia, pp. 277-280.