Author:
Nazmov Vladimir,Goldenberg Boris
Reference8 articles.
1. SU-8: a Photoresist for High-Aspect-Ratio and 3D Submicron Lithography;del Campo;Journal of micromechanics and microengineering,2007
2. Experiments on X-ray Lithography Using Synchrotron Radiation from the VEPP-2M Storage Ring;Gluskin;Nuclear Instr. Meth.Phys.Res.,1983
3. Goldenberg, B.G., Lemzyakov, A.G., Nazmov, V.P., Pindyurin, V.F., 2017. Multifunctional X-ray lithography Station at VEPP-3. This workshop. The SFR-2016 Conference.
4. Micromachining Applications of a High Resolution Ultrathick Photoresist;Lee;J. Vac. Sci. Technol. B,1995
5. memscyclopedia: http://www.memscyclopedia.org/su8.html.
Cited by
1 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献