Thermal process of iron silicides prepared by Magnetron sputtering-Reference-Cited by-同舟云学术

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Thermal process of iron silicides prepared by Magnetron sputtering

Published:2011 Issue: Volume:11 Page:122-125
ISSN:1875-3892
Container-title:Physics Procedia
language:en
Short-container-title:Physics Procedia

Author:

Zhang J.,Xie Q.,Liang Y.,Zeng W.,Xiao Q.,Chen Q.,Ma D.,Wang Y.,Yamada Koji,Luo Jiaolian

Publisher

Elsevier BV

Subject

General Engineering

Reference13 articles.

1. Semiconducting Silicides,2000

2. A silicon/iron-disilicide light-emitting diode operating at a wavelength of 1.5 μm

3. Theoretical and experimental study of interband optical transitions in semiconducting iron disilicide

4. Epitaxial growth and luminescence characterization of Si/β-FeSi2/Si multilayered structures by molecular beam epitaxy

5. Surface diffusion of Fe and island growth of FeSi2 on Si(111) surfaces

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Annealing Time Influence on Optical Characteristic of Beta-FeSi₂ Thin Film;Advanced Materials Research;2015-04

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