Photo-initiated deposition and etching of materials relevant to semiconductor devices-Reference-Cited by-同舟云学术

Photo-initiated deposition and etching of materials relevant to semiconductor devices

Published:1988-01 Issue:1 Volume:12 Page:1-85
ISSN:0079-6727
Container-title:Progress in Quantum Electronics
language:en
Short-container-title:Progress in Quantum Electronics

Author:

Haigh J.,Aylett M.R.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials,Statistical and Nonlinear Physics

Reference369 articles.

1. Laser chemical vapor deposition: A technique for selective area deposition

2. Abstract: Laser chemical vapor deposition of metals and insulators

3. Laser chemical vapor deposition of selected area Fe and W films

4. Transient nonlinear laser heating and deposition: A comparison of theory and experiment

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