Optical properties of nitride-rich SiN<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" altimg="si32.svg" display="inline" id="d1e814"><mml:msub><mml:mrow/><mml:mrow><mml:mi>x</mml:mi></mml:mrow></mml:msub></mml:math> and its use in CMOS-compatible near-UV Bragg filter fabrication-Reference-Cited by-同舟云学术

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Optical properties of nitride-rich SiNx and its use in CMOS-compatible near-UV Bragg filter fabrication

Published:2024-12 Issue: Volume:24 Page:100348
ISSN:2590-1478
Container-title:Optical Materials: X
language:en
Short-container-title:Optical Materials: X

Author:

Wolffenbuttel Reinoud F.^ORCID,Winship Declan,Qin Yutao,Gianchandani Yogesh,Bilby David,Visser Jaco H.

Funder

Ford Motor Co

Publisher

Elsevier BV

Reference45 articles.

1. Characteristic study of silicon nitride films deposited by LPCVD and PECVD;Yang;Silicon,2018

2. Optimization of a low-stress silicon nitride process for surface-micromachining applications;French;Sensors Actuators A,1997

3. PECVD silicon-rich nitride and low stress nitride films mechanical characterization using membrane point load deflection;Bagolini;J. Micromech. Microeng.,2016

4. Surface micromachined optical low-cost all-air-gap filters based on stress-optimized Si3N4 layers;Irmer;J. Micromech. Microeng.,2005

5. Design and fabrication of ultrathin silicon-nitride membranes for use in UV-visible airgap-based MEMS optical filters;Ghaderi;J. Phys. Conf. Ser.,2016

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