Author:
Ma X.,Kato Y.,Kempen F.,Hirai Y.,Tsuchiya T.,Keulen F.,Tabata O.
Reference7 articles.
1. One-step 3D shaping using a gray-tone mask for optical and microelectronic applications;Oppliger;Microelectron. Eng.,1994
2. Moving mask UV lithography for three-dimensional structuring;Hirai;J. Micromech. Microeng.,2007
3. W. Iwasaki et al. , Maskless lithographic fine patterning on deeplyetched or slanted surfaces, and grayscale lithography, using newlydeveloped digital mirror device lithography equipment,Jpn. J. Appl. Phys., 51 (2012) 06FB05.
4. X. Maet al. , Experimental study of numerical optimization for 3D microstructuring using DMD-based grayscale lithography, J. Microelectromech. Syst.,accepted.
5. F. Kempenet al. , Automatic process design for 3D thick-film grayscale photolithography, in Proc. the 17th International Conference on Solid-State Sensors Actuators and Microsystems (Transducers’13), Barcelona, Spain, pp.1625-1628.
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