Chemical vapor deposition and homogeneous nucleation in fluidized bed reactors: silicon from silane-Reference-Cited by-同舟云学术

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Chemical vapor deposition and homogeneous nucleation in fluidized bed reactors: silicon from silane

Published:1986 Issue:4 Volume:41 Page:633-641
ISSN:0009-2509
Container-title:Chemical Engineering Science
language:en
Short-container-title:Chemical Engineering Science

Author:

Lai S.,Dudukovic' M.P.,Ramachandran P.A.

Publisher

Elsevier BV

Subject

Applied Mathematics,Industrial and Manufacturing Engineering,General Chemical Engineering,General Chemistry

Reference28 articles.

1. Mathematical model of the coupled fluid mechanics and chemical kinetics in a chemical vapor deposition reactor;Coltrin;J. Electrochem. Soc.,1984

2. Removal of the fine particulates from gases in fluidized beds;Doganoglu;Trans. I. Chem. E.,1978

3. Reactor models for CVD of silicon;Duduković;JPL Publication,1983

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