Preparation of silicon dioxide films by low-pressure chemical vapor deposition on dense and porous alumina substrates
Author:
Publisher
Elsevier BV
Subject
Applied Mathematics,Industrial and Manufacturing Engineering,General Chemical Engineering,General Chemistry
Reference24 articles.
1. Rapid thermal annealed low pressure chemical-vapor-deposited SiO2 as gate dielectric in silicon MOSFET's;Ang;J. electrochem. Soc.,1987
2. Selective isopentane formation from CH3OH on a new one-atomic layer ZrO2/ZSM-5 hybrid catalyst;Asakura;Catal. Lett.,1988
3. A new method for chemical vapor deposition of silicon dioxide;Avigal;J. electrochem. Soc.,1974
4. Low temperature pyrolytic deposition of high quality SiO2;Bennett;J. electrochem. Soc.,1987
5. Silane oxidation study: analysis of data for SiO2 films deposited by low temperature chemical vapour deposition;Cobianu;Thin Solid Films,1984
Cited by 19 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Semi-Permanent Hydrophilization of Polyester Textile by Polymerization and Oxidation Using Atmospheric Pressure Dielectric Barrier Discharge (APDBD);Korean Journal of Materials Research;2023-04-27
2. Porous ceramics for catalytic applications;Ceramic Catalysts;2023
3. Synthesis of Silica Membranes by Chemical Vapor Deposition Using a Dimethyldimethoxysilane Precursor;Membranes;2020-03-22
4. Compositional, Optical and Electrical Characteristics of SiOx Thin Films Deposited by Reactive Pulsed DC Magnetron Sputtering;Coatings;2019-07-25
5. β-(Al,Ga)2O3 for High Power Applications — A Review on Material Growth and Device Fabrication;International Journal of High Speed Electronics and Systems;2019-03
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3