Author:
Tan Yicheng,Zhang Jingtong,Chen Peng,Zhu Zuoxiang,Wu Shanghua,Tian Zhuo
Funder
Guangdong Provincial Pearl River Talents Program
Subject
Materials Chemistry,Surfaces, Coatings and Films,Process Chemistry and Technology,Ceramics and Composites,Electronic, Optical and Magnetic Materials
Reference22 articles.
1. A Systematic Study and Characterization of Advanced Corrosion Resistance Materials and Their Applications for Plasma Etching Processes in Semiconductor Silicon Wafer Fabrication;Shih,2012
2. Extending lifetime of yttrium oxide as a plasma chamber material;Shih,2012
3. Characteristics of yttrium fluoride and yttrium oxide coatings for plasma process equipment prepared by atmospheric plasma spraying;Lin;Jpn. J. Appl. Phys.,2016
4. Fluorination mechanisms of Al2O3 and Y2O3 surfaces irradiated by high-density CF4∕O2 and SF6∕O2 plasmas;Miwa;J. Vac. Sci. Technol.: Vacuum Surfaces Films,2009
5. Preparation and characterization of sprayed-yttrium oxyfluoride corrosion protective coating for plasma process chambers;Lin;Coatings,2018
Cited by
6 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献