Influences of different sputtering current on the microstructure and electrical properties of silicon nitride thin films deposited on cemented carbide tools-Reference-Cited by-同舟云学术

Influences of different sputtering current on the microstructure and electrical properties of silicon nitride thin films deposited on cemented carbide tools

Published:2021-11 Issue:22 Volume:47 Page:32160-32167
ISSN:0272-8842
Container-title:Ceramics International
language:en
Short-container-title:Ceramics International

Author:

Zhou Di,Huang Lei,Yuan Juntang,Li Chao

Funder

National Natural Science Foundation of China

Natural Science Foundation of Jiangsu Province

Jiangsu Planned Projects for Postdoctoral Research Funds

Fundamental Research Funds for the Central Universities

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Process Chemistry and Technology,Ceramics and Composites,Electronic, Optical and Magnetic Materials

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