Study on The Performance of PECVD Silicon Nitride Thin Films

Author:

Liu Liang,Liu Wei-guo,Cao Na,Cai Chang-long

Funder

Project for Optoelectronic Applications

Basic Research Project OF National Defense

Publisher

Elsevier BV

Subject

Metals and Alloys,Mechanical Engineering,Ceramics and Composites,Computational Mechanics

Reference12 articles.

1. Study of thin films of silicon nitride deposited by PECVD and beam properties;Yu;J Funct Mater Devices,2010

2. Plasma etching: from micro- to nanoelectronics;Shamiryan;Plasma Chem,2009

3. Etching of silicon nitride in CCL2F2, CHF3, SiF4, and SF6 reactive plasma: a comparative study;Pant;Plasma Chem Plasma Process,1999

4. The study on the morphology control of silicon etching by ICP;Liu;Chin J Sens Actuators,2011

5. Optimization of a low-stress silicon nitride process for surface-micromachining applications;French;Sens Actuators A Phys,1997

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