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Effects of interlayer roughness on deposition rate and morphology of aerosol-deposited Al2O3 thick films

  • Published:2012-09 Issue:7 Volume:38 Page:5621-5627
  • ISSN:0272-8842
  • Container-title:Ceramics International
  • language:en
  • Short-container-title:Ceramics International

Author:

Kim Chang-Wan,Choi Joo-Hyun,Kim Hyung-Jun,Lee Dong-Won,Hyun Chang-Yong,Nam Song-Min

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Process Chemistry and Technology,Ceramics and Composites,Electronic, Optical and Magnetic Materials

Reference17 articles.

1. Issues in etching compound and Si-based devices;Wlkinson;Japanese Journal of Applied Physics,2002

2. Plasma-resistant dense yttrium oxide film prepared by aerosol deposition process;Iwasawa;Journal of the American Ceramic Society,2007

3. Dense yttrium oxide film prepared by aerosol deposition process at room temperature;Iwasawa;Journal of the Ceramic Society of Japan,2006

4. Silicon micromachining using a high-density plasma source;McAuley;Journal of Physics D: Applied Physics,2001

5. Analysis of oxide coatings formed on Al1050 alloy by plasma electrolytic oxidation;Kim;Journal of the Korean Ceramic Society,2009

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