Atomic layer deposition of molybdenum oxide using (N Bu)2(NMe2)2Mo, hydrogen peroxide (H2O2), and ozone (O3) for DRAM application
Author:
Funder
Samsung
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Process Chemistry and Technology,Ceramics and Composites,Electronic, Optical and Magnetic Materials
Reference30 articles.
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4. Optical and electrical properties of MoO2 and MoO3 thin films prepared from the chemically driven isothermal close space vapor transport technique;De Melo;J. Phys. Condens. Matter,2019
5. The effect of molybdenum oxide interlayer on organic photovoltaic cells;Kim;Appl. Phys. Lett.,2009
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