Author:
Liao Defeng,Chen Xianhua,Tang Caixue,Xie Ruiqing,Zhang Zhe
Subject
Materials Chemistry,Surfaces, Coatings and Films,Process Chemistry and Technology,Ceramics and Composites,Electronic, Optical and Magnetic Materials
Reference38 articles.
1. J.Y. Lai, Mechanics, mechanisms, and modeling of the chemical mechanical polishing process (Ph.D. dissertation), Massachusetts Institute of Technology, 2001.
2. J.T. Abiade, Characterization of the chemical effects of ceria slurries for dielectric chemical mechanical polishing (Ph.D. dissertation), University of Florida, 2004.
3. A polishing process for nonlinear optical crystal flats based on an annular polyurethane pad;Liao;Applied Surface Science,2012
4. Improvement of Surface Figure in the Polyurethane Pad Continuous Polishing Process;Liao;Applied Mechanics and Materials,2013
5. Mid-spatial Frequency Error (PSD-2) of optics induced during CCOS and full-aperture polishing;Liao;Journal of the European Optical Society—Rapid Publications,2013
Cited by
33 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献