Chapter 4 Sputtering
Author:
Publisher
Elsevier
Reference78 articles.
1. “Amorphous and Liquid Semiconductors”;Anderson,1977
2. Importance of argon pressure in the preparation of rf‐sputtered amorphous silicon–hydrogen alloys
3. An assessment of the suitability of rf sputtered amorphous hydrogenated Si as a potential solar cell material
4. Hydrogen evolution and defect creation in amorphous Si: H alloys
5. Structural, Optical, and Electrical Properties of Amorphous Silicon Films
Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Microcrystalline silicon.;Journal of Non-Crystalline Solids;2004-06
2. Growth chemistry of amorphous silicon and amorphous silicon–germanium alloys;Current Opinion in Solid State and Materials Science;2002-10
3. Hydrogen analysis in hydrogenated amorphous silicon thin films produced by d.c. reactive magnetron sputtering;Materials Chemistry and Physics;1993-03
4. A review of amorphous silicon alloys;Journal of Non-Crystalline Solids;1987-07
5. MICROSTRUCTURE CONSIDERATIONS IN HYDROGENATED AMORPHOUS SILICON THIN FILMS;Amorphous Metals and Semiconductors;1986
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