Importance of argon pressure in the preparation of rf‐sputtered amorphous silicon

登录注册会员服务联系我们

Importance of argon pressure in the preparation of rf‐sputtered amorphous silicon–hydrogen alloys

Published:1979-05 Issue:3 Volume:16 Page:906-912
ISSN:0022-5355
Container-title:Journal of Vacuum Science and Technology
language:en
Short-container-title:Journal of Vacuum Science and Technology

Author:

Anderson D. A.,Moddel G.,Paesler M. A.,Paul William

Publisher

American Vacuum Society

Subject

General Engineering

Link

http://avs.scitation.org/doi/pdf/10.1116/1.570111

Cited by 81 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Substrate Potential Dependence of Optical Characteristics of a-Si:H for Shortwave Near-infrared Filter by DC and RF Sputtering;e-Journal of Surface Science and Nanotechnology;2022-03-24

2. Effect of RF power on the properties of intrinsic hydrogenated amorphous silicon passivation layer deposited by facing target sputtering;Applied Physics Express;2018-01-31

3. Photoluminescence of highly porous nanostructured Si-based thin films deposited by pulsed laser ablation;Journal of Applied Physics;2005-07-15

4. The effect of target nitridation on structural properties of InN grown by radio-frequency reactive sputtering;Thin Solid Films;2002-12

5. Optical absorption in an amorphous silicon superlattice grown by molecular beam epitaxy;Solid State Communications;2002-05

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP