A contamination reducing method by ion beam bombardment of the specimen in high resolution electron microscopy-Reference-Cited by-同舟云学术

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A contamination reducing method by ion beam bombardment of the specimen in high resolution electron microscopy

Published:1988-01 Issue:3 Volume:19 Page:163-173
ISSN:0739-6260
Container-title:Micron and Microscopica Acta
language:en
Short-container-title:Micron and Microscopica Acta

Author:

Kanaya Koichi,Oho Eisaku,Osaki Nobuyoshi,Oda Tomohiko

Publisher

Elsevier BV

Subject

Anatomy

Reference27 articles.

1. Formation of thin polymer films by electron bombardment;Christy;J. appl. Phys.,1960

2. Particle growth in the electron microscope;Cosslett;J. appl. Phys.,1947

3. Solid State Physics,1975

4. Reduction of electron beam induced radiation damage of organic material by cooling to 4 K (cryo electron microscopy);Dietrich,1982

5. The origin of specimen contamination in the electron microscope;Ennos;Br. J. appl. Phys.,1953

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Reaction-diffusion study of electron-beam-induced contamination growth;Ultramicroscopy;2024-10

2. Electron-Beam-Induced Carbon Contamination in STEM-in-SEM: Quantification and Mitigation;Microscopy and Microanalysis;2022-12-20

3. High resolution radially symmetric nanostructures from simultaneous electron beam induced etching and deposition;Nanotechnology;2007-12-06

4. Characterization of focused electron beam induced carbon deposits from organic precursors;Microelectronic Engineering;2005-03

5. In situ control of the focused-electron-beam-induced deposition process;Applied Physics Letters;2003-11-10

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