Low-hydrogen-concentration a-Si:H deposited by direct photo-CVD
Author:
Publisher
Elsevier BV
Subject
General Engineering
Reference25 articles.
1. Properties of a-Si:H prepared by the photochemical decomposition of Si2H6
2. Excimer-Laser-Induced Chemical Vapor Deposition of Hydrogenated Amorphous Silicon
3. Vacuum UV Photoabsorption Spectra of Silane and Disilane: Molecular Orbital Calculation of Electronic States
4. Windowless helium lamp assisted chemical vapor deposition of hydrogenated amorphous silicon
5. Deposition of high‐quality a‐Si:H by direct photodecomposition of Si2H6 using vacuum ultraviolet light
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1. Impact of VUV photons on SiO2 and organosilicate low-k dielectrics: General behavior, practical applications, and atomic models;Applied Physics Reviews;2019-03
2. Effect of Substrate Temperature on the Optical Properties of a-Si:H Films by RF-PECVD;Acta Physico-Chimica Sinica;2007
3. On the Effect of Substrate Temperature on a-Si:H Deposition Using an Expanding Thermal Plasma;MRS Proceedings;1996
4. Effect of the gas pressure during deposition on the optical properties of HOMOCVD a-Si:H thin films;Solar Energy Materials and Solar Cells;1995-01
5. Influence of the substrate temperature on the photoelectric properties of HOMOCVD a-Si:H;Solar Energy Materials and Solar Cells;1995-01
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