Separate structure extended gate H+-ion sensitive field effect transistor on a glass substrate

Author:

Yin Li-Te,Chou Jung-Chuan,Chung Wen-Yaw,Sun Tai-Ping,Hsiung Shen-Kan

Publisher

Elsevier BV

Subject

Materials Chemistry,Electrical and Electronic Engineering,Metals and Alloys,Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation,Electronic, Optical and Magnetic Materials

Reference20 articles.

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2. Clifford D. Fung, Peter W. Cheung, Wen H. Ko, A generalized theory of an electrolyte-insulator-semiconductor field effect transistor, IEEE Trans. Electron Devices 33 (1986) 8–18.

3. Stanley D. Moss, Curtis C. Johnson, Jirijanata, Hydrogen, calcium and potassium ion sensitive FET transistors a preliminary report, IEEE Trans. Biomed. Eng. 25 (1978) 49–54.

4. Hung-Kwei Liao, Jung-Chuan Chou, Wen-Yaw Chung, Tai-Ping, Shen-Ken Hsiung, Study on the interface trap density of the Si3N4/SiO2 gate ISFET, in: Proceedings of the Third East Asian Conference on Chemical Sensors, Seoul, South Korea, 5–6 November 1997, pp. 394–400.

5. Li-Te Yin, Jung-Chuan Chou, Wen-Yaw Chung, Tai-Ping Shen-Ken Hsiung, Characteristics of silicon nitride after O2 plasma treatment for pH ISFET applications, in: Proceeding of 1998 International Electron Devices and Materials Symposia, B, C, National Cheng Kung University, Tainan, Taiwan, ROC, December 1998, pp. 267–270.

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