Author:
Rosental A.,Tarre A.,Gerst A.,Sundqvist J.,Hårsta A.,Aidla A.,Aarik J.,Sammelselg V.,Uustare T.
Subject
Materials Chemistry,Electrical and Electronic Engineering,Metals and Alloys,Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation,Electronic, Optical and Magnetic Materials
Reference18 articles.
1. Atomic-layer chemical vapor deposition of SnO2 for gas-sensing applications;Rosental;Sens. Actuators B,2001
2. T. Suntola, Atomic layer epitaxy, in: D.T.J. Hurle (Ed.), Handbook of Crystal Growth, vol. 3, Elsevier, Amsterdam, 1994, pp. 601–663.
3. Surface chemistry for atomic layer growth;George;J. Phys. Chem.,1996
4. Atomic layer deposition (ALD): from precursors to thin film structures;Leskelä;Thin Solid Films,2002
5. The growth of thin, epitaxial SnO2 films for gas sensing applications;Semancik;Thin Solid Films,1991
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