1. Development of High Speed Nanometer Positioning Table System and Its Performances Evaluation;Hashizume;(in Japanese), Transactions of the JSME,1998
2. Linear Motor-Levitated Stage for Photolithography;Kim;Annals of the CIRP,1997
3. High-Response X-Y Stage System Driven by In-Parallel Linear Motors;Tomita;Annals of the CIRP,1996
4. Magnetic Bearing Stage for Photolithography;Williams;Annals of the CIRP,1993
5. Sato, C., Tsukamoto, S. and Shinno, H., 1995, Electrorheological Fluid Damper for a Slide Mechanism, U.S. Patent Office, Patent #5,462,361