Author:
Takeuchi M,Inoue K,Yoshino Y,Ohwada K
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference10 articles.
1. Hickernell, S. F., IEEE Ultrasonic Symp., 1980, p. 785
2. Effects of Target Erosion on the Growth Rate of Films Fabricated by the Sputtering Method.
3. Nishihara, M. and Kimura, T., Symp. Microjoining and Assembly Technology in Electronics, Tokyo, 1995, p. 133 (in Japanese)
4. Film thickness distribution in magnetron sputtering
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