The effective density of induced interface states of ionized cluster beam deposited Ag/n-Si Schottky junctions
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference13 articles.
1. Drummond TJ. Phys Rev B 1999;59:8182 and references therein.
2. Hasegawa H. Jpn J Appl Phys 1999;38:1098 and references therein.
3. Takagi T. Ionized cluster beam deposition and epitaxy. Park Ridge, NJ, USA: Noyes Publications, 1988 (see for instance Fig. 3.13, p. 46).
4. Ion cluster beam deposition of thin films
5. An investigation of cluster formation in an ionized cluster beam deposition source
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