Surface morphology of TiN films reactively deposited by bias sputtering
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference5 articles.
1. Highly adhesive TiN thin films prepared on glass by the electron shower method
2. Structure and adhesive properties of TiN films reactively deposited by plasma-free sputtering
3. Effect of surface roughness on magnetic properties of Fe films deposited by dual ion beam sputtering
4. Bias Effect on the Microstructure and Diffusion Barrier Capability of Sputtered TiN and TiOxNyFilms
5. Yamazato M, Yamagata Y, Ikegami T, Ebihara K. Proceedings of the Fourth International Symposium on Sputtering and Plasma Processes. 1997. p. 635.
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1. Influence of Substrate Negative Bias on Structure and Properties of TiN Coatings Prepared by Hybrid HIPIMS Method;Journal of Materials Science & Technology;2015-01
2. Investigation of Ti/TiN multilayered films in a reactive mid-frequency dual-magnetron sputtering;Applied Surface Science;2007-01
3. Surface modification of exchange-coupled Co/NiOx magnetic bilayer by bias sputtering;Applied Surface Science;2005-10
4. Optimum Growth Conditions of Ge–Sb–Te Alloy Thin Film Investigated by Ellipsometry;Japanese Journal of Applied Physics;2004-03-10
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