1. Stability and sensitivity of an EWMA controller;Ingolfsson;J. Qual. Technol.,1993
2. A. Hu, E. Sachs, A. Ingolfsson, Run by run process control: performance benchmarks, in: IEEE/SEMI International Semiconductor Manufacturing Science Symposium, 73, San Francisco, CA, June 1992.
3. Process control system for VLSI fabrication;Sachs;IEEE Trans. Semicond. Manuf.,1991
4. Run by run control of chemical–mechanical polishing;Boning;IEEE Trans. CPMT(C),1996
5. Run by run process control: combining SPC and feedback control;Sachs;IEEE Trans. Semicond. Manuf.,1995