PLS based dEWMA run-to-run controller for MIMO non-squared semiconductor processes

Author:

Chen Junghui,Wang Fan

Publisher

Elsevier BV

Subject

Industrial and Manufacturing Engineering,Computer Science Applications,Modelling and Simulation,Control and Systems Engineering

Reference27 articles.

1. Stability and sensitivity of an EWMA controller;Ingolfsson;J. Qual. Technol.,1993

2. A. Hu, E. Sachs, A. Ingolfsson, Run by run process control: performance benchmarks, in: IEEE/SEMI International Semiconductor Manufacturing Science Symposium, 73, San Francisco, CA, June 1992.

3. Process control system for VLSI fabrication;Sachs;IEEE Trans. Semicond. Manuf.,1991

4. Run by run control of chemical–mechanical polishing;Boning;IEEE Trans. CPMT(C),1996

5. Run by run process control: combining SPC and feedback control;Sachs;IEEE Trans. Semicond. Manuf.,1995

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