Radiation Thermometry in the Semiconductor Industry-Reference-Cited by-同舟云学术

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Radiation Thermometry in the Semiconductor Industry

Published:2010 Issue: Volume: Page:137-216
ISSN:1079-4042
Container-title:Experimental Methods in the Physical Sciences
language:
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Author:

Adams Bruce E.,Schietinger Charles W.,Kreider Kenneth G.

Publisher

Elsevier

Reference108 articles.

1. Optical Pyrometry Begins to Fulfill its Promise;Braun,1998

2. Optical Fiber Thermometer;Dils,1986

3. Reliability Improvement Methods for Sapphire Fiber Temperature Sensors;Schietinger,1997

4. Temperature measurements using optical fibers;Schietinger;Electronics Cooling,1997

5. In-Situ Optical Wafer Temperature Measurement;Adams,2002

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1. Thermometry in Laser Micro/Nanofabrication;Handbook of Laser Micro- and Nano-Engineering;2021

2. Thermometry in Laser Micro/Nanofabrication;Handbook of Laser Micro- and Nano-Engineering;2020

3. Non-contact temperature measurement of silicon wafers based on the combined use of transmittance and radiance;Measurement;2014-05

4. Measuring temperature of silicon monocrystals using spectral pyrometry;Russian Microelectronics;2014-05

5. A method of reducing background radiance for emissivity-compensated radiation thermometry of silicon wafers;Review of Scientific Instruments;2013-02

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