Environmentally benign synthesis of a PGM-free catalyst for low temperature CO oxidation
Author:
Funder
Air Force Office of Scientific Research
U.S. Department of Energy
Publisher
Elsevier BV
Subject
Process Chemistry and Technology,General Environmental Science,Catalysis
Reference58 articles.
1. Surface-structure sensitivity of CO oxidation over polycrystalline ceria powders;Aneggi;J. Catal.,2005
2. Oxygen vacancy clusters promoting reducibility and activity of ceria nanorods;Xiangwen;J. Am. Chem. Soc.,2009
3. Molecular-level understanding of CeO2as a catalyst for partial alkyne hydrogenation;Carrasco;J. Phys. Chem. C.,2014
4. The selective hydrogenation of acetylene in the presence of carbon monoxide over Ni and Ni-Zn supported on MgAl2O4;Trimm;Catal. Today,2011
5. Design of effective catalysts for selective alkyne hydrogenation by doping of ceria with a single-atom promotor;Riley;J. Am. Chem. Soc.,2018
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