Sticking probability of CN(X2Σ+) radicals onto amorphous carbon nitride films formed from the decomposition of BrCN induced by the microwave discharge flow of Ar

Author:

Ito Haruhiko,Araki Hitoshi,Wada Akira,Yamamoto Ayumi,Suzuki Tsuneo,Saitoh Hidetoshi

Publisher

Elsevier BV

Subject

Spectroscopy,Instrumentation,Atomic and Molecular Physics, and Optics,Analytical Chemistry

Reference55 articles.

1. Principles of Plasma Discharges and Materials Processing;Lieberman,2005

2. Spectroscopy of Low Temperature Plasma;Ochkin,2009

3. Deposition of Diamond-Like Superhard Materials;Kulisch,1999

4. CRC Handbook of Chemistry and Physics;Fuhr,1998

5. Symmetry breaking in nitrogen-doped amorphous carbon: Infrared observation of the Raman-activeGandDbands

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