Possible application of micromachine technology for nanometer lithography-Reference-Cited by-同舟云学术

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Possible application of micromachine technology for nanometer lithography

Published:1998-09 Issue:9 Volume:29 Page:601-611
ISSN:0026-2692
Container-title:Microelectronics Journal
language:en
Short-container-title:Microelectronics Journal

Author:

Wada Y.

Publisher

Elsevier BV

Subject

General Engineering

Reference43 articles.

1. Technology challenges for integration near and below 0.1 μm;Asai,1997

2. CMOS scaling into the nanometer regime;Taur,1997

3. The future of the transistor;Keyes;Physics Today,1992

4. Lithographic technologies for future ULSI;Okazaki;Appl. Surf. Sci.,1993

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2. Synthesis and Self-Assembly of Large-Area Cu Nanosheets and Their Application as an Aqueous Conductive Ink on Flexible Electronics;ACS Applied Materials & Interfaces;2013-12-13

3. Selective Electroless Metallization of Patterned Polymeric Films for Lithography Applications;ACS Applied Materials & Interfaces;2009-01-12

4. The Origin of Nanoscopic Grooving on Vesicle Walls in Submarine Basaltic Glass: Implications for Nanotechnology;Journal of Nanomaterials;2009

5. Lithographic Techniques in Nanocatalysis;Nanocatalysis;2007

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