Heat transport in masks for deep X-ray lithography during the irradiation process-Reference-Cited by-同舟云学术

Heat transport in masks for deep X-ray lithography during the irradiation process

Published:1997-03 Issue:3 Volume:28 Page:349-355
ISSN:0026-2692
Container-title:Microelectronics Journal
language:en
Short-container-title:Microelectronics Journal

Author:

Neumann M.,Pantenburg F.J.,Rohde M.,Sesterhenn M.

Publisher

Elsevier BV

Subject

General Engineering

Reference11 articles.

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3. Analyse der Defektursachen und der Genauigkeit der Strukturübertragung bei der Röntgentiefenlithographie mit Synchrotronstrahlung;Mohr;KfK Report 4414,1988

4. Adhesion problems in deep-etch X-ray lithography caused by fluorescence radiation from the plating base;Pantenburg;Microelectronic Eng.,1994

5. Finite Elements for Thin Shells and Curved Members,1976

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