Aberration compensation in charged particle projection lithography-Reference-Cited by-同舟云学术

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Aberration compensation in charged particle projection lithography

Published:1999-05 Issue:1-2 Volume:427 Page:292-298
ISSN:0168-9002
Container-title:Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment

Author:

Zhu Xieqing,Munro Eric,Liu Haoning,Rouse John

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference8 articles.

1. Electron-optical design for the SCALPEL proof-of-concept tool

2. H. C. Chu (X. Zhu), E. Munro, Optik 61 (1982) 121.

3. Analysis of off-axis-shaped beam systems for high-throughput electron-beam lithography

4. PROJECTION Software, User Manual, Version 2.1, Munro's Electron Beam Software Ltd. (1997).

5. On Electron Projection Systems

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Notes and References;Principles of Electron Optics;2018

2. Projection electron beam lithography for nanotechnology;Bulletin of the Russian Academy of Sciences: Physics;2010-07

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