Design considerations of 10kW-scale, extreme ultraviolet SASE FEL for lithography

Author:

Pagani C,Saldin E.L,Schneidmiller E.A,Yurkov M.V

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. (TMT)nclusters as dilute debris-free tin source for generation of multiply charged tin ions of relevance in extreme ultraviolet (EUV) lithography, under intense laser irradiation;Rapid Communications in Mass Spectrometry;2018-06-07

2. kW-class picosecond thin-disc prepulse laser Perla for efficient EUV generation;Journal of Micro/Nanolithography, MEMS, and MOEMS;2017-11-24

3. Laser acceleration;RIV NUOVO CIMENTO;2017

4. A non-conventional ERL configuration for high-power EUV FELs;Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment;2015-09

5. Laser applications in nanotechnology: nanofabrication using laser ablation and laser nanolithography;Physics-Uspekhi;2013-07-31

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