(TMT)nclusters as dilute debris-free tin source for generation of multiply charged tin ions of relevance in extreme ultraviolet (EUV) lithography, under intense laser irradiation-Reference-Cited by-同舟云学术

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(TMT)nclusters as dilute debris-free tin source for generation of multiply charged tin ions of relevance in extreme ultraviolet (EUV) lithography, under intense laser irradiation

Published:2018-06-07 Issue:14 Volume:32 Page:1135-1140
ISSN:0951-4198
Container-title:Rapid Communications in Mass Spectrometry
language:en
Short-container-title:Rapid Commun Mass Spectrom

Author:

Sharma Pramod¹^ORCID,Das Soumitra¹,Vatsa Rajesh K.¹

Affiliation:

1. Chemistry Division; Bhabha Atomic Research Centre; Mumbai 400 085 India

Publisher

Wiley

Subject

Organic Chemistry,Spectroscopy,Analytical Chemistry

Reference41 articles.

1. Principles of Lithography

2. The chips are down for Moore's law;Waldrop;Nature,2016

3. Miniaturized electronics;Charles;J Hopkins APL Tech Dig,2005

4. Ultrafast deep UV Lithography with excimer lasers;Jain;IEEE Electron Device Lett,1982

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Efficient coupling of picosecond laser pulses with (CCl4)n clusters: Linear vs circular polarization;Optik;2021-11

2. Multiple ionisation and Coulomb explosion in terawatt photoexcitation of Xenon clusters: An experimental and theoretical study;Journal of Photochemistry and Photobiology A: Chemistry;2021-01

3. Interaction of (CCl4)n clusters with nanosecond and picosecond laser pulses at discrete wavelengths spanning from IR to UV region: A comparative study using TOFMS;International Journal of Mass Spectrometry;2020-04

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