Angular dependence of silicon oxide formation and gold segregation due to low-energy O2+ implantation
Author:
Publisher
Elsevier BV
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference28 articles.
1. Sputtering of Surfaces by Positive Ion Beams of Low Energy
2. Notizen: Die positive Sekundärionenemission von sauerstoffbedeckten Metallen
3. Progress in analytic methods for the ion microprobe mass analyzer
4. Anomalous enhancement of negative sputtered ion emission by oxygen
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1. Correlating surface segregation and microstructural evolution of electrochemically deposited copper;Applied Physics Letters;2012-09-03
2. Characteristics of altered layers formed by sputtering with a massive molecular ion containing diverse elements with large mass differences;Journal of Applied Physics;2007-10
3. Quantitative study of oxygen enhancement of sputtered ion yields. I. Argon ion bombardment of a silicon surface with O2 flood;Surface Science;2004-12
4. Local SiO2 formation in silicon bombarded with oxygen above the critical angle for beam-induced oxidation: new evidence from sputtering yield ratios and correlation with data obtained by other techniques;Surface and Interface Analysis;2000
5. XPS study of incident angle effects on the ion beam modification of InP surfaces by 6 keV O-2(+);SURF INTERFACE ANAL;1999
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