Composition and crystal structure of N doped TiO2 film deposited at different O2 flow rate by direct current sputtering
Author:
Publisher
Elsevier BV
Subject
General Environmental Science,General Medicine,Environmental Chemistry,Environmental Engineering
Reference21 articles.
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3. The properties of ultra-thin a-SiNx films prepared by microwave ECR magnetic sputtering;Ding,2007
4. Influences of deposition parameter on chemical structure and moisture resistant properties for SiN* films deposited by DC pulse magnetron sputtering;Ding;Acta Physica Sinica,2009
5. The effect of N2 flow rate on discharge characteristics of microwave electron cyclotron resonance plasma;Ding;Physics of Plasmas,2009
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