The effect of N2 flow rate on discharge characteristics of microwave electron cyclotron resonance plasma
Author:
Publisher
AIP Publishing
Subject
Condensed Matter Physics
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3126963
Reference26 articles.
1. The preparation, characterization and applications of silicon nitride thin films
2. Micromachined pressure sensors: review and recent developments
3. Optimization of a low-stress silicon nitride process for surface-micromachining applications
4. Materials Research Society Symposium Proceedings;Nisato G.,2004
5. Coverage properties of SiNx films prepared by catalytic chemical vapor deposition on trenched substrates below 80 °C
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