Effect of thermal annealing on stress relaxation and crystallisation of ion beam sputtered amorphous Si1-xGex thin films-Reference-Cited by-同舟云学术

Effect of thermal annealing on stress relaxation and crystallisation of ion beam sputtered amorphous Si1-xGex thin films

Published:2018-10 Issue: Volume:156 Page:389-397
ISSN:0264-1275
Container-title:Materials & Design
language:en
Short-container-title:Materials & Design

Author:

Guo F.,Martyniuk M.,Silva D.,Liu Y.^ORCID,Brookshire K.,Faraone L.

Funder

Australian Research Council

University, State and Commonwealth Governments

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,General Materials Science

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