Investigation of dual work function metal (DWFM) gate stacks with ALD TaAlN and TaAlC for multi threshold voltages (VTHs) engineering in MOS device integration

Author:

Choi Moonsuk,Sim Jihyeon,Kim Hyeongjun,Lim Hyun Jin,Kim Ki Sub,Choi ChanghwanORCID

Funder

NRF

Ministry of Science, ICT and Future Planning

Publisher

Elsevier BV

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