Thermally assisted ECR etching of CdTe in CCl2F2/Ar discharge under different gas flow ratio
Author:
Publisher
Elsevier BV
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference23 articles.
1. Reactive ion beam etching of ZnSe and ZnS epitaxial films using Cl2electron cyclotron resonance plasma
2. Low damage thermally assisted electron cyclotron resonance etch technology for wide bandgap II-VI materials
3. Fabrication of dry etched CdZnSe/ZnSe quantum wires by thermally assisted electron cyclotron resonance etching
4. ECR plasma etching of GaAs in CCl2F2/Ar/O2 discharge and IR studies of the etched surface
5. CH4/H2: A universal reactive ion etch for II‐VI semiconductors?
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