Effect of ternary compound on HfO2-Al2O3 mixture coatings revealed by solid-state NMR and TOF-SIMS-Reference-Cited by-同舟云学术

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Effect of ternary compound on HfO2-Al2O3 mixture coatings revealed by solid-state NMR and TOF-SIMS

Published:2024-12 Issue: Volume:184 Page:108785
ISSN:1369-8001
Container-title:Materials Science in Semiconductor Processing
language:en
Short-container-title:Materials Science in Semiconductor Processing

Author:

Wen Jiahui^ORCID,Ke Liang,Ren Jinjun,Shao Jianda,Zhu Meiping

Publisher

Elsevier BV

Reference41 articles.

1. Finding nature's missing ternary oxide compounds using machine learning and density functional theory;Hautier;Chem. Mater.,2010

2. A map of the inorganic ternary metal nitrides;Sun;Nat. Mater.,2019

3. A stable rhombohedral phase in ferroelectric Hf(Zr)1+xO2 capacitor with ultralow coercive field;Wang;Science,2023

4. Mechanical polarization switching in Hf0.5Zr0.5O2 thin film;Guan;Nano Lett.,2022

5. Toward high performance anodes for sodium-ion batteries: from hard carbons to anode-free systems;Liu;ACS Cent. Sci.,2023

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