Polarity control of sputter-deposited AlN with high-temperature face-to-face annealing
Author:
Publisher
Elsevier BV
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
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1. Effects of gallium surfactant on AlN thin films by microwave plasma chemical vapor deposition;Journal of Semiconductors;2024-09-01
2. III-Nitride Magnetron Sputter Epitaxy on Si: Controlling Morphology, Crystal Quality, and Polarity Using Al Seed Layers;ACS Applied Materials & Interfaces;2024-06-17
3. Relationship between Annealing and V/III Ratios during MNVPE of AlN Films;Crystal Growth & Design;2024-03-21
4. HiPIMS-grown AlN buffer for threading dislocation reduction in DC-magnetron sputtered GaN epifilm on sapphire substrate;Vacuum;2023-11
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