Nickel mono-silicide formation using a photo-thermal process assisted by ultra-violet laser
Author:
Funder
MSIP
Publisher
Elsevier BV
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference24 articles.
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2. Nickel silicide nanowire arrays for anti-reflective electrodes in photovoltaics;Dasgupta;Adv. Funct. Mater.,2012
3. Nucleation and atomic layer reaction in nickel silicide for defect-engineered Si nanochannels;Tang;Nano Lett.,2013
4. Study of formation mechanism of nickel silicide discontinuities in high-performance complementary metal–oxide–semiconductor devices;Kudo;Jpn. J. Appl. Phys.,2014
5. Phase formation and thermal stability of ultrathin nickel-silicides on Si(100);De Keyser;Appl. Phys. Lett.,2010
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1. Design on Formation of Nickel Silicide by a Low‐Temperature Pulsed Laser Annealing Method to Reduce Contact Resistance for CMOS Inverter and 6T‐SRAM on a Wafer‐Scale Flexible Substrate;Advanced Electronic Materials;2023-10-15
2. Application of nanosecond laser to a direct and rapid growth of Cu-BTC metal-organic framework thin films on copper substrate;Surfaces and Interfaces;2022-06
3. Selective photo-thermal modulation of ZnO/Pt interface for monolithic 3D integration of oxide-based resistive random access memory;Applied Surface Science;2020-08
4. Nickel Film Deposition with Varying RF Power for the Reduction of Contact Resistance in NiSi;Coatings;2019-05-28
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