Indium tin oxide etch characteristics using CxH2x+2(x=1,2,3)/Ar
Author:
Publisher
Elsevier BV
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference25 articles.
1. Room temperature deposition of very thin and flexible crystalline ITO thin film using 3-D facing-magnetron sputtering plasma source;Wen;Vacuum,2021
2. Improved electrical and optical properties of ultra-thin tin doped indium oxide (ITO) thin films by a 3-dimensionally confined magnetron sputtering source;Wen;Sci. Adv. Mater.,2021
3. Excimer Ablation of ITO on Flexible Substrates for Large Format Display Applications;Ghandour,2002
4. Enhancement of the light output of GaN-based light-emitting diodes with surface-patterned ITO electrodes by maskless wet-etching;Leem;Solid State Electron.,2007
5. Outcoupling enhancement of OLEDs with a randomly distributed ITO pattern fabricated by maskless wet etching method;Jang;IEEE/OSA Journal of Display Technology,2013
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