Author:
Sarmiento Samael,Delgado Mendinueta José Manuel,Altabás José Antonio,Spadaro Salvatore,Shinada Satoshi,Furukawa Hideaki,Vegas Olmos Juan José,Lázaro José Antonio,Wada Naoya
Funder
FEDER, Spain
European Union’s Horizon 2020 research and innovation programme
MINECO, Spain
Subject
Electrical and Electronic Engineering,Physical and Theoretical Chemistry,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference51 articles.
1. J.J.V. Olmos, et al. 400G Interconnects for data centres and high-performance computing–What is Next? in: Int. Conf. Transparent Opt. Netw. Bucharest, Rumania, 2018.
2. A.J. Strojwas, K. Doong, D. Ciplickas, Yield and reliability challenges at 7 nm and below, in: Electron Devices Technol. and Manufacturing Conf. Singapore, 2019.
3. 7-nm FinFET CMOS design enabled by stress engineering using Si, Ge, and Sn;Gupta;IEEE Trans. Electron Devices,2014
4. W. Bogaerts, Scaling up silicon photonics: where are the challenges, in: Opt. S. Workshop, Laussanne, Switzerland, 2017.
5. N. Stojanovic, C. Prodaniuc, L. Zhang, J. Wei, 210/225 Gbit/s PAM-6 transmission with BER below KP4-FEC/EFEC and at least 14 dB link budget, in: European Conference on Optical Communication, ECOC, Rome, 2018.
Cited by
5 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献