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Determination of metallic contaminants on Ge wafers using direct- and droplet sandwich etch-total reflection X-ray fluorescence spectrometry

  • Published:2003-12 Issue:12 Volume:58 Page:2093-2104
  • ISSN:0584-8547
  • Container-title:Spectrochimica Acta Part B: Atomic Spectroscopy
  • language:en
  • Short-container-title:Spectrochimica Acta Part B: Atomic Spectroscopy

Author:

Hellin D,Bearda T,Zhao C,Raskin G,Mertens P.W,De Gendt S,Heyns M.M,Vinckier C

Publisher

Elsevier BV

Subject

Spectroscopy,Instrumentation,Atomic and Molecular Physics, and Optics,Analytical Chemistry

Cited by 12 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Different Fields of Applications;Total-Reflection X-Ray Fluorescence Analysis and Related Methods;2014-12-19

2. Performance of TXRF and GI-XRF Analyses;Total-Reflection X-Ray Fluorescence Analysis and Related Methods;2014-12-19

3. Novel Analytical Methods for Cleaning Evaluation;Handbook of Cleaning in Semiconductor Manufacturing;2011-02-22

4. X-ray Spectrometry;Analytical Chemistry;2006-05-10

5. Trends in total reflection X-ray fluorescence spectrometry for metallic contamination control in semiconductor nanotechnology;Spectrochimica Acta Part B: Atomic Spectroscopy;2006-05
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