Trace metal analysis on hafnium silicate deposited Si wafer by Total Reflection X-ray Fluorescence

Author:

Takahara Hikari,Murakami Hiroyuki,Kinashi Toru,Sparks Chris

Publisher

Elsevier BV

Subject

Spectroscopy,Instrumentation,Atomic and Molecular Physics, and Optics,Analytical Chemistry

Reference12 articles.

1. ITRS site: http://www.itrs.net/Links/2005ITRS/Home2005.htm

2. Whole-surface analysis of semiconductor wafers by accumulating short-time mapping data of total reflection X-ray fluorescence spectroscopy;Mori;Anal. Chem.,2002

3. Detection of unknown localized contamination on Si wafer surface by sweeping total reflection X-ray fluorescence;Mori;Spectrochim. Acta Part B,2004

4. H. Takahara, H. Nii, K. Nishihagi, New TXRF techniques developed for advanced semiconductor technology, 11th International Conference on TXRF Spectrometry abstract, p. 42, 2005, Budapest, Hungary.

5. Advanced TXRF analysis: background reduction when measuring high-k materials and mapping metallic contamination;Sparks;Solid State Phenom.,2008

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