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Parameter study of self-absorption effects in Total Reflection X-ray Fluorescence–X-ray Absorption Near Edge Structure analysis of arsenic

  • Published:2008-12 Issue:12 Volume:63 Page:1496-1502
  • ISSN:0584-8547
  • Container-title:Spectrochimica Acta Part B: Atomic Spectroscopy
  • language:en
  • Short-container-title:Spectrochimica Acta Part B: Atomic Spectroscopy

Author:

Meirer F.,Pepponi G.,Streli C.,Wobrauschek P.,Kregsamer P.,Zoeger N.,Falkenberg G.

Publisher

Elsevier BV

Subject

Spectroscopy,Instrumentation,Atomic and Molecular Physics, and Optics,Analytical Chemistry

Reference22 articles.

1. Total reflection X-ray fluorescence analysis — a review;Wobrauschek;X-Ray Spectrom.,2007

2. Total Reflection X-ray Fluorescence Analysis;Klockenkamper,1997

3. A new SR-TXRF vacuum chamber for ultra-trace analysis at HASYLAB, Beamline L;Streli;X-Ray Spectrom.,2005

4. Recent results of synchrotron radiation induced total reflection X-ray fluorescence analysis at HASYLAB, Beamline L;Streli;Spectrochim. Acta Part B,2006

5. X-ray absorption spectroscopy on copper trace impurities on silicon wafers;Singh,2002

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