Deposition of Me-C: H coatings from metal organic precursors using a plasma-activated r.f. process
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference11 articles.
1. Target effects during the deposition of Ti-a-C:H films
2. Properties of diamond-like carbon
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