Effect of temperature on the deposition rate and properties of hydrogenated amorphous carbon films
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference19 articles.
1. rf‐plasma deposited amorphous hydrogenated hard carbon thin films: Preparation, properties, and applications
2. Plasma Deposited Thin Films;Angus,1986
3. Process monitoring of a‐C:H plasma deposition
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